MKS Instruments is a world leader in the manufacture of Plasma Sources, RF Sources, Pulsed DC Sources and Impedance matching networks,
MKS Instruments designs and manufactures toroidal RF plasma sources to energize and dissociate gases. Fluorine gases, such as NF3, are used for cleaning the walls of vacuum process units. Plasma sources for processes of heat, heat, nitrogen and hydrogen generation.
The plasma array of MKS Instruments is segmented according to the application: plasma sources for NF3 and fluorine based gases, ideal for cleaning unwanted deposits from inner walls of fine film deposition process chambers; and plasma sources for O2, N2, H2, H2O, ideal for applications such as photo-resistance removal, chip pre-cleaning and nitriding and oxidation of thin films.
The MKS Instruments family of RF sources provide reliable, solid state power for thin film processing equipment. These sources are vital components for semiconductor manufacturing systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. In conjunction with impedance matching networks and the V / I probe, the sources form a complete RF delivery system.
DC Power Supplies
MKS Instruments RDPG series pulsed DC power supplies provide asymmetrical bipolar and unipolar pulsed DC power for PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition) coating and reinforcement coating applications. The RPDG line eliminates performance limiting factors, allowing existing PVD tools to produce the low quality, low defect films required for next generation processes.
Impedance matching networks
Matchwork® impedance matching networks provide quick and efficient adjustment of your RF generator for applications such as PECVD, HDPCVD and etc. The MKS line of off-the-shelf networks and custom auto-matching provides fast and efficient impedance matching for all your solar, semiconductor and flat panel applications.
MKS matching networks use fuzzy logic algorithms and stepper motor technology to produce fast, accurate and repeatable matching. MKS automatic tuning tuning networks quickly convert plasma impedances to 50 ohms to maximize the transfer of power to your camera.